Tutorial Lecture

Topic:

Control of Microstructure Evolution During Sputter Deposition

Time/Date/Place:

10:40-12:00, Oct. 27, Room 204

Summary

This module will elucidate the fundamental processes of film nucleation and growth and how they can be manipulated by low-energy metal and gas ion fluxes to achieve high-quality films at low deposition temperatures.

Topics

• Film growth processes-nucleation, coalescence, competitive grain growth, recrystallization
• Zone diagrams
• Effects of sputtered atoms energy
• Effects of reactive species.
• Texture inheritance
• Metal-ion etch and adhesion control
• Kinetic roughing and surface facet formation
• Use of low-energy ion bombardment to control microstructure during low temperature film growth
• Effects of gas-ion energy
• Use of high fluxes of low-energy gas ions; low-temperature sputter epitaxy
• HiPIMS – source of energetic metal ions
• Use of synchronized bias in HIPIMS
• Hybrid HiPIMS/DCMS co-sputtering
• Ligh metal-ions; supersaturated metastable TM nitrides
• Heavy metal ions; low temperature, dense, stress-free hard coatings

Lecturer:

Prof. Ivan Petrov
PhD, D.h.c., Professor
Materials Research Laboratory, Univ. of Illinois at Urbana-Champaign, USA
Department of Physics, Linköping University, Sweden